From: http://spie.org/Images/Graphics/Newsroom/Imported/79/79_fig1.jpg
Extreme UV (EUV) photolithography is an advanced photolithography technique that uses 10-14 nm wavelengths. Some other properties of EUV:
- Strongly absorbed in almost all materials, so a vacuum is needed.
- Reflective optics using bragg reflectors with alternating layers of molybdenum and silicon.
- Expensive because sources that produce such small wavelengths are costly.