Category Archive: Machines

Current Applications of MEMS Energy Harvesters

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Current Applications There are several commercialized MEMS-based energy harvesting products on the market. This report will focus on the Volture devices by Mide Technology Corporation, the Micro Generating System for a Watch by Kinetron, the Perpetuum Free-Standing Harvester, and attempts at commercializing shoe energy harvesters. One piezoelectric energy harvester is the Volture System, which is …

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ITO (indium tin oxide)

From: http://www.2spi.com/catalog/standards/images/ITO.gif

ITO is composed of a mixture of indium, tin, and oxide. Because it is a transparent conductor when made in a thin layer, it is often used in solar cells and LCD screens. Transparent electrode Deposited by sputtering

Ion Beam Lithography

ionbeamlithography

Ga+ ions 8 nm resolution Lower energy ions produce less backscattering  

Scanning Probe Lithography

ibmxenonstm

Uses STM and AFM to generate patterns in the resist. AFM lithography The AFM tip can modify the surface by indenting it into a soft polymer. Applying a voltage allows for the electrophysical properties of the sample surface to be changed. STM Single Atom Lithography Using a scanning tunneling microscope to move individual atoms. Has …

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E-beam Lithography

From http://www.mie.utoronto.ca/labs/amnl/images/labpics/30.jpg

Uses a focused beam of electrons. Resolution: 10 nm Used to make masks, where slow speed is acceptable. Resolution limited by electron scattering. Resists: PMMA  

X-ray Lithography

From: http://www.bellhs.net/news/newsimg/Synchrotron01.jpg

Resolution: 0.2 microns, and aspect ratio of 100. Large depth of focus No vacuum High throughput Masks are expensive, and hard to make (requires high aspect ratio micromachining) No optics, no projection. Very expensive X-ray sources: synchrotron radiation ( accelerated electrons emit x-rays) PMMA is a positive resist PGMA is a negative resist  

EUV Photolithography

EUV

  Extreme UV (EUV) photolithography is an advanced photolithography technique that uses 10-14 nm wavelengths. Some other properties of EUV: Strongly absorbed in almost all materials, so a vacuum is needed. Reflective optics using bragg reflectors with alternating layers of molybdenum and silicon. Expensive because sources that produce such small wavelengths are costly.